Archive for 'September 2010'

    Samsung’s Eight-Stack Flash Shows up in Apple’s iPhone 4

    September 13, 2010 10:44 AM by Dick James
    Back in 2005 Samsung made an announcement that they would be shipping eight die stacked in the same package. At the time it seemed remarkable, but we didn’t see it any time soon after that, so it got lost in the noise of other package developments and the increasing TSV (through-silicon vias) hype.

    Last year we commented, in the now defunct Semiconductor International, on a 16GB Sandisk Micro-SD flash card that had nine die stacked together, thinned to a remarkable 30 µm each.

    Sandisk 16 GB Flash Stack in Micro-SD Card

    Now Samsung have delivered, in the new iPhone; our 32-GB version had one Samsung flash part within, a K9PFG08U5M (below), which their part number decoder reveals as a 256 Gb MLC (multi-level cell) NAND flash device.


    One digit decodes as ‘ODP’, which isn’t clarified, but once the chip was taken off the board and x-rayed, we could see eight dies, so octal-die package seems to work. It doesn’t show up too well in plan-view, but a side-view x-ray makes it clear enough:


    So, having seen the x-ray, I asked one of our lab guys to see if he could section one of the wire bond stacks that we can see in the above image. The bonds at opposite ends of the package aren’t in the same plane, so we can only get one set of bonds, but to me he did a pretty good job.


    The package, including substrate, is ~0.93 mm thick, and the die stack is ~670 µm high. Die thicknesses vary from 55 – 70 µm, with the thickest die at the bottom. Thinner than the 1.4 mm announced in 2005, and not quite the 0.6 mm quoted in last year’s ‘ultra-thin’ release , but impressive nonetheless.


    What surprised me, when I looked closely at the section, was how close to the top surface the top wirebond loop is – that’s 25-µm wire, so it looks to be less than 10 µm from surface – that’s minimising encapsulant for sure!

    Every time we tear down something like the iPhone, it is clear that it’s not only the chip technology that makes these toys possible; they wouldn’t be the same without the parallel developments from the TAP part of the business, not to mention the software.

    Still, as with the Sandisk, it poses the question: If we can build stacks of dies like this with wire bonding, will through-silicon vias ever become economic in the commodity chip arena?

DickJames100x100

DICK JAMES is a 40-year veteran of the semiconductor industry and the senior technology analyst for Chipworks, an Ottawa, Canada-based specialty reverse engineering company. Chipworks analyses a broad range of devices, giving Dick a unique overview of what technologies make it into the real world of semiconductor production.

Previous Posts

Intel Foundries MEMS for Fuel Cell Start-up Nectar

01/30/2013

IBM surprises with 22nm details at IEDM

12/12/2012

Intel details 22nm trigate SoC process at IEDM

12/11/2012

GlobalFoundries takes on Intel with 14nm finFET “eXtreme Mobility” process

10/02/2012

The Elephant Has Left the Room – 450 mm is a Go!

07/10/2012

Sony’s PS Vita Uses Chip-on-Chip SiP – 3D, but not 3D

07/06/2012

Intel’s 22-nm Trigate Transistors Exposed

04/24/2012

Intel to Present on 22-nm Tri-gate Technology at VLSI Symposium

04/12/2012

Dialog Semi Gets the Girls for Apple

04/02/2012

Semicon China – SMIC Shows off 28-nm HKMG Development

03/20/2012

GloFo’s FinFETS are Better than Intel's! Musings from CPTF

03/18/2012

GlobalFoundries' Ajit Manocha Visits CES

01/17/2012

Intel Press Briefing and Keynote at CES 2012

01/13/2012

TI Debuts 28-nm OMAP 5 Processor at CES

01/11/2012

IEDM 2011: IBM displays via-middle TSV process for die stacking

12/07/2011

© 2013. PennWell Corporation. All Rights Reserved. PRIVACY POLICY | TERMS AND CONDITIONS