March 26, 2012 -- Micronova Nanofabrication Centre selected a Vistec Lithography Inc. electron-beam lithography (e-beam litho) system for its nanotechnology laboratory in Finland. The litho tool will be used for nano/microelectronics, nano/micro-fabrication, and nanophotonics research in a multi-user environment.
More than 360 employees and students from different facilities carry out research in diverse nanotechnology fields at Micronova. The electron-beam lithography system from Vistec enabled the highest level of research with flexibility for different pursuits, said Dr. Veli-Matti Airaksinen, director of Aalto Nanofab at Micronova.
The Vistec EBPG5000pES is equipped for 100kV/1mm performance under regular electron-optical conditions with a wide capability for high-throughput applications. The electron-optical column is rated for acceleration voltages of 50 and 100kV, enabling a spot size down to <2.2nm. Nano-lithography structures smaller than 8nm are easily generated, Vistec reports. An interactive graphical user interface (GUI) eases multi-user operation within a large research institute.
Vistec is increasingly working with advanced research institutes and universities installing electron-beam lithography systems. The environment enables Vistec to develop its technology for cutting edge applications, the company notes, eventually suiting a wider industry need. Also read: Vistec installs first e-beam lithography EBPG5000pES in Chinese university and Vistec brings nano-fab e-beam litho tool to UC San Diego
Micronova Nanofabrication Centre is Finland's National Research Infrastructure for micro- and nanotechnology, jointly operated by Aalto University and VTT Technical Research Centre of Finland. Micronova's activities extend from fundamental physics to device prototyping, applied research and small-scale manufacturing. Technologies developed at Micronova include nanoelectronic and photonic devices, MEMS sensors, particle and X-ray detectors and THz technology.
The Vistec Electron Beam Lithography Group is a global manufacturer and supplier of electron-beam lithography systems with applications ranging from nano and bio-technology to photonics and industrial environments like mask making or direct writing for fast prototype development and design evaluation. The Vistec Electron Beam Lithography Group combines Vistec Lithography and Vistec Electron Beam. Learn more at www.vistec-semi.com.