CaF2 debate: Flat vs. round, 121nm litho?

The Bridgman-Stockbarger method of growing CaF2 has been around for decades. Now that the semiconductor industry has an escalating need for the material — a reported "must have" for lens systems in 157nm lithography tools — debate has focused on the adequacy of supply and the technique used to obtain it.

"Current technology cannot make CaF2 crystals of sufficient purity and yield to make them economical for mass production of semiconductor or other high-tech products," states Kiril Pandelisev, CEO and chief science officer at Single Crystal Technologies (SCT).


Figure 1. SCT's purification apparatus.
Click here to enlarge image

SCT proposes a new crystal-growing method that uses a flat plate or slab (Fig. 1) rather than the traditional round ingot (Fig. 2). Being able to control impurities is key to the performance of 157nm lens systems. Impurities in the crystal affect softness/hardness, which in turn affects creep, as well as built-in stress. (Lenses change shape — "creep" — over time due to the force of gravity.) Lead fluoride is used to control oxygen in 193nm optics, but because lead has an absorption band at 157nm, it cannot be used at that wavelength. Furthermore, rare earth metals form color centers in CaF2 that start to fluoresce.


Figure 2. Bridgman-Stockbarger method. (Source: Single Crystal Technologies)
Click here to enlarge image

Pandelisev explains that in the Bridgman-Stockbarger method the interface separating the solid section of CaF2 from the liquid CaF2 is not a flat surface but forms a shape similar to a meniscus. As the crystal grows, the properties of the liquid change as well. The center of the melt becomes dirtier because it solidifies later than the edges, and over time the melt properties change for the worse.

"The yield is very low," says Pandelisev. "Out of about 100 crystals, you might get only three good ones. Built-in stress due to uneven heat distribution becomes 'frozen' in the crystal. The result is birefringence."

Because the technique developed by SCT has the material in the form of a slab, heat is dissipated faster, and as a result the crystal has lower built-in stress and less birefringence. "The distance between the center of the plate and the outside surface of the plate is only about 2.5 in.," Pandelisev notes. "In the traditional cylindrical boule, the heat barrier [the distance over which heat is dissipated] is about 8 in."

In June, the company sent samples to Los Alamos and Sandia National Labs for purity analysis, and to MIT's Lincoln Lab for other quality testing. Sure to cause discussion is Pandelisev's claim that high-purity LiF can be produced by the company's technology.

"Our technology can open the doors to 121nm lithography that can enable the 30nm technology node," he says. "Ternary and/or quarternary LiF-based compounds might extend the transmission to even shorter than a 121nm wavelength and smaller than 30nm device technology. The current efforts on EUV technology based on very high COO equipment might be obsolete from their inception." —D.V.

Font Sizes:

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.


VIDEOS

Electroiq 2 EIQ2

NEW PRODUCTS

Spectra-Physics introduces industrial picosecond laser

May 10, 2013 Spectra-Physics, a Newport Corporation brand, introduces Spirit ps 1040-10, an industrial-grade picosecond laser for precision ...

Multitest announces ecoAmp for high-power applications

May 8, 2013 Multitest announces that its ecoAmp high power Kelvin contactor successfully passed a challenging evaluation for an automotive ...

EV Group rolls out EVG120 processing system

May 7, 2013 EV Group (EVG), a supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, t...

Quartz Imaging introduces automated measurement for semiconductor images

April 30, 2013

It can be very time-consuming for engineers to measure the various features of an X-SEM image of a semiconductor device.


TECHNOLOGY PAPERS

Rapid Defect Indentification with Layout-Aware Diagnosis

Scan logic diagnosis is a powerful tool to help failure analysis engineers determine the root cause of a failing die. Yield engineers, on the other hand, are...

Flip Chip Devices get Flat and Happy

Thin is definitely in, but what our modern flip chip devices really want is to be flat and happy! As flip chip die have become increasingly thinner in recent...

WEBCASTS

Surface Cleaning and Preparation

This introduction requires the development of new critical and selective cleans tackling galvanic corrosion, pattern collapse both in FEOL and BEOL...

450mm Status Report

Hear from the G450C General Manager, Paul Farrar Jr., on the current status of activities, key milestones and schedules, and imec’s senior business...

Join The ConFab discussion

Tue Feb 26 11:27:00 CST 2013

Questions and answers on FD-SOI

Fri Jan 04 14:56:00 CST 2013

Present your ideas at The ConFab in 2013

Mon Nov 26 09:04:00 CST 2012

The ConFab 2013 countdown begins

Thu Aug 09 16:18:00 CDT 2012

The ConFab: Big data is here

Sun Jun 03 19:19:00 CDT 2012

SUBSCRIBE

LATEST ISSUE

05/01/2013
Volume 56, Issue 3

Article Archive for Solid State Technology.

© 2013. PennWell Corporation. All Rights Reserved. PRIVACY POLICY | TERMS AND CONDITIONS