Expanded CV test systems
The System 80 Series of CV measurement instruments has been expanded to include I-V testing, analysis software, and integration with hot chucks and probers. These systems can provide simultaneous quasistatic and high-frequency C-V testing, improving measurement accuracy when characterizing interface trap densities and doping profiles in semiconductor wafers. The systems can perform similar tests on thin-film transistors used in AMLCD panels, and are particularly suited to very thin oxide testing and characterization. Model 82-WIN includes all instrumentation, cables, and software necessary for the user to construct a complete simultaneous C-V system. It operates in a Windows environment with Metrics-ICS software, and its capabilities include: oxide thickness and gate area; series resistance; flatband C and V; threshold voltage; effective oxide charge density; metal-semiconductor work function; average doping, using true Cmin; band bending; and bulk potential. Keithley Instruments Inc., Cleveland, OH; ph 440/248-0400, fax 440/248-6168, e-mail firstname.lastname@example.org, www.