Over 2,000 industry professionals attended last week’s SPIE Advanced Lithography, where important progress reports were revealed on extreme ultraviolet (EUV), lithography, directed self-assembly (DSA), metrology, and related topics. The event ran February 24-28 in San Jose, California.
"There was much discussion about the continuation of Moore's Law, both in terms of the technical ability to shrink as well as the cost," said symposium chair Harry Levinson of GLOBALFOUNDRIES. "Achievement of a significant milestone for EUV sources that should enable more rapid progress in EUV lithography was reported, as was the potential for a EUV pellicle -- a welcomed prospect. And EUV extension to higher resolution, where we face many challenges, was the subject of many papers."
On Thursday morning, Cymer announced that they had met "key milestones" in recent tests of their EUV technology in an ASML lithography scanner.
David Brandt, Cymer's Senior Director of EUV Marketing, reported new results for EUV power output as a light source for lithography, including a key announcement of 40 watts of EUV light in continuous operation using MOPA Prepulse technology. Hear more in the SPIE Newsroom video interview.
"In addition to the good news of EUV source power achievements, there were first signs of considerations for EUV adoption in high volume, coming from infrastructure development such as EUV mask actinic inspection, EUV mask OPC, and EUV lithography integration in a full CMOS flow with yield-defectivity investigations," said symposium co-chair Mircea Dusa (ASML US).
DSA continued to be a subject of high interest, Dusa said: "What caught my attention was the modeling developments combined with applicability on real circuits: a major milestone for future potential adoption."
Levinson and Dusa also noted the event's high level of topical synergy evidenced by multiple joint sessions on topics such as lithographic solutions for chip-design layout, and its characteristic large conference-room audiences, particularly in the 2-year-old Etch conference and the 27-year-old Metrology and Process Control conference.
A well-trafficked two-day exhibition connected attendees with semiconductor suppliers, integrators, and optical device manufacturers, and a set of professional development courses on EUV lithography, DSA, optical lithography, FEOL/MOL/BEOL lithography, and related technologies began the week.
Accepted conference proceedings papers will be published in the SPIE Digital Library as soon as approved after the meeting, and in print volumes and digital collections.
Next year's event will return to the San Jose Marriott and San Jose Convention Center, with conferences and professional development courses 23-27 February and the exhibition 25-26 February.
SPIE is the international society for optics and photonics, a not-for-profit organization founded in 1955 to advance light-based technologies. The Society serves nearly 225,000 constituents from approximately 150 countries, offering conferences, continuing education, books, journals, and a digital library in support of interdisciplinary information exchange, professional networking, and patent precedent. SPIE provided over $3.2 million in support of education and outreach programs in 2012.