July 25, 2012 - Marketwire -- Mattson Technology, Inc. (NASDAQ:MTSN), semiconductor processing equipment maker, installed its paradigmE etch system at a major semiconductor foundry.
The tool uses Mattson's proprietary Faraday-Shielded inductively coupled plasma (ICP) source technology, along with bias capability for anisotropic etching of 300mm wafers. Mattson also offers high-throughput wafer transfer platforms for the etch step. The newest generation, paradigmE Si, debuted at SEMICON West 2011.
Also read: Solvent-free plasma removal of etch polymers from STMicroelectronics and Mattson
The paradigmE etch system order marks the third fab to install the tool. The paradigmE etch system is now in production in foundry/logic, memory and CMOS image sensor fabs across multiple regions, including China, Korea and Taiwan.
Mattson Technology, Inc. designs, manufactures and markets semiconductor wafer processing equipment used in the fabrication of integrated circuits. Internet: www.mattson.com.
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