MRS Day 3: Nanoimprint litho, 32nm memories, FET/Si/CNT sensors

Techcet's Michael A. Fury continues his series of observations from this year's MRS Spring meeting in San Francisco. From Day 3: Noncontact planarization; nanoimprint lithography; sub-32nm memory; sensors made with FETs, Si, and CNTs, solution-phase metal-semiconductor nanowires; patterned organic electronics, inkjet printed sensors, and a flow coating method for highly aligned semiconducting polymer films.

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