EU group takes stride toward optical interconnects

April 12, 2010 - An EU-funded project has come one step closer to its goal of building silicon photonics circuits, with the creation of a fully CMOS-compatible laser source coupled to a silicon waveguide.

Using a circuit design from partners INL and IMEC, Leti says it has completed process studies for the laser source to adapt and modify standard III-V materials process steps compliant with a CMOS environment, replacing gold-based metal contacts with a Ti/TiN/AlCu metal stack on 200mm wafers in its facilities. Results are being presented this week at SPIE Photonics Europe 2010 in Brussels.


Click to Enlarge Click to Enlarge

(Left) Top view of the WADIMOS circuit, showing microdisk laser and silicon waveguides. The laser light is launched into
the silicon waveguide by evanescent coupling. (Right) SEM view of the microdisk laser which is planarized. (Source: Leti)


The work is part of the WADIMOS project (Wavelength Division Multiplexed Photonic Layer on CMOS), an EU-funded three-year project (total budget €3.2M) through 2010 seeking to solve problematic requirements with ever-beefier computing systems. The advent of multiprocessor systems and advanced manufacturing tools is ushering in an age of >100Tb/sec data transfer rates, needed on-chip (e.g., multicore processors) and/or off-chip in short-distance interconnects (10-100m).

The goal of WADIMOS is to devise, build, and demonstrate a photonic interconnect layer on CMOS with optical interconnects capable of handling such ultrahigh-speed data transfer rates. Final deliverables are pledged to be: a photonic interconnect layer with multichannel microsources, microdetectors and different advanced wavelength routing functions directly integrated with electronic driver circuits. (Last year WADIMOS participant IMEC tipped off some initial work with integrating photonic circuitry with high-speed CMOS.)

Two applications for silicon photonics are being pursued by the group. One is an optical network-on-chip (for WADIMOS participant STMicroelectronics) with photonic layer including complex wavelength division multiplexing functionality, both for increasing the data rate and for increasing the routing flexibility. Another application is a terabit-sized optical datalink for project participant Mapper Lithography, addressing the >100TB/s data rates requirements in moving litho patterns generated in the subfab to the actual litho equipment.

The WADIMOS partners, and their specific project tasks:

  • IMEC (through the U. of Ghent's photonics research group): Project coordinator; design ultracompact SOI waveguide circuits for routing and demultiplexing; contribute to fabrication of the sources and integration with waveguides.
  • STMicroelectronics: Investigate the viability of optical networks-on-chip, and design the required CMOS-circuits.
  • CEA-Leti: Develop integration process and fabricate the photonic layer in a standard CMOS pilot line, including III-V based microsources.
  • Lyon Institute of Nanotechnology (INL): Design and fabrication of microsource arrays; contribute to the optical network-on-chip studies; manage design of the optical routers.
  • Trento University's (UNITN) silicon photonics group: Design optical WDM circuits based on coupled ring resonators.

Font Sizes:

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.


VIDEOS

Electroiq 2 EIQ2

NEW PRODUCTS

Spectra-Physics introduces industrial picosecond laser

May 10, 2013 Spectra-Physics, a Newport Corporation brand, introduces Spirit ps 1040-10, an industrial-grade picosecond laser for precision ...

Multitest announces ecoAmp for high-power applications

May 8, 2013 Multitest announces that its ecoAmp high power Kelvin contactor successfully passed a challenging evaluation for an automotive ...

EV Group rolls out EVG120 processing system

May 7, 2013 EV Group (EVG), a supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, t...

Quartz Imaging introduces automated measurement for semiconductor images

April 30, 2013

It can be very time-consuming for engineers to measure the various features of an X-SEM image of a semiconductor device.


TECHNOLOGY PAPERS

Rapid Defect Indentification with Layout-Aware Diagnosis

Scan logic diagnosis is a powerful tool to help failure analysis engineers determine the root cause of a failing die. Yield engineers, on the other hand, are...

Flip Chip Devices get Flat and Happy

Thin is definitely in, but what our modern flip chip devices really want is to be flat and happy! As flip chip die have become increasingly thinner in recent...

WEBCASTS

Surface Cleaning and Preparation

This introduction requires the development of new critical and selective cleans tackling galvanic corrosion, pattern collapse both in FEOL and BEOL...

450mm Status Report

Hear from the G450C General Manager, Paul Farrar Jr., on the current status of activities, key milestones and schedules, and imec’s senior business...

Join The ConFab discussion

Tue Feb 26 11:27:00 CST 2013

Questions and answers on FD-SOI

Fri Jan 04 14:56:00 CST 2013

Present your ideas at The ConFab in 2013

Mon Nov 26 09:04:00 CST 2012

The ConFab 2013 countdown begins

Thu Aug 09 16:18:00 CDT 2012

The ConFab: Big data is here

Sun Jun 03 19:19:00 CDT 2012

SUBSCRIBE

LATEST ISSUE

05/01/2013
Volume 56, Issue 3

Article Archive for Solid State Technology.

© 2013. PennWell Corporation. All Rights Reserved. PRIVACY POLICY | TERMS AND CONDITIONS