Tegal+AMMS eyes growth in 3D packaging, MEMS

Sept. 7, 2008 - Tegal Corp.'s proposed acquisition of Alcatel Micro Machining Systems' (AMMS) deep reactive ion etch (DRIE) and plasma-enhanced chemical vapor deposition (PECVD) products is "a critical part of our growth strategy" to extend into higher-growth markets in 3D IC packaging and MEMS devices, the company asserts.

Under terms of the deal, Tegal will buy Alcatel Micro Machining Systems' (AMMS) and Alcatel-Lucent's deep reactive ion etch (DRIE) and plasma-enhanced chemical vapor deposition (PECVD) products and related IP in a $5M in cash-and-stock transaction. Tegal will continue development of the AMMS DRIE product line, including integrating AMMS' process modules on its recently-introduced Compact bridge platform, and the completion of a 300mm process chamber. AMMS will continue to support its existing installed base of DRIE tools in use by MEMS and IDMs, and Tegal will assume responsibility for AMMS' joint development programs with key customers and research and academic institutions.

The deal is "an important strategic move for Tegal" to aggressively pursue the large high-growth markets in MEMS and semiconductor device manufacturing, said Thomas Mika, chairman/president/CEO of Tegal, in a statement. Gilbert Bellini, president of AMMS, who will be appointed to Tegal's board of directors, added that Tegal will particularly target "the rapidly expanding markets for 3D wafer-level packaging applications."

Deep reactive-ion etching (DRIE) is a highly anisotropic etch process used to create deep, steep-sided holes and trenches in wafers (>20:1 aspect ratios). Current end-markets include a variety of MEMS and power devices, memory stacking (flash and DRAM), logic, RF-SiP, and CMOS image sensors. But now attention is also turning to MEMS devices and through-silicon via (TSV) for advanced packaging applications.


Click here for larger view


In an online Q&A, Tegal explained that its MEMS customers already using its materials etch and PVD systems have been asking the toolmaker to get a foothold in DRIE for over two years. Moreover, the DRIE segment targeting these markets is largely packed with smaller companies -- including AMMS, which according to Yole Développement was the #2 DRIE tool supplier in 2007 (see Fig. 1) -- and is poised for significant growth through 2012 (~$148M to $434M, a 31% CAGR) (see Fig. 2). Most of the suppliers base their technology on the Bosch process; exceptions include Ulvac, Shinko Seiki, and Oxford Instruments.


Click here for larger view

About six people are expected to move over to Tegal from AMMS in Annecy, France, over a six-month transition period, with a total of 6-10 people in various positions added over several months. The addition of AMMS will not change Tegal's manufacturing strategy, which is to outsource some critical components but bring as much assembly/final test into its Petaluma, CA facility.


Font Sizes:

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.


VIDEOS

Electroiq 2 EIQ2

NEW PRODUCTS

Spectra-Physics introduces industrial picosecond laser

May 10, 2013 Spectra-Physics, a Newport Corporation brand, introduces Spirit ps 1040-10, an industrial-grade picosecond laser for precision ...

Multitest announces ecoAmp for high-power applications

May 8, 2013 Multitest announces that its ecoAmp high power Kelvin contactor successfully passed a challenging evaluation for an automotive ...

EV Group rolls out EVG120 processing system

May 7, 2013 EV Group (EVG), a supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, t...

Quartz Imaging introduces automated measurement for semiconductor images

April 30, 2013

It can be very time-consuming for engineers to measure the various features of an X-SEM image of a semiconductor device.


TECHNOLOGY PAPERS

Rapid Defect Indentification with Layout-Aware Diagnosis

Scan logic diagnosis is a powerful tool to help failure analysis engineers determine the root cause of a failing die. Yield engineers, on the other hand, are...

Flip Chip Devices get Flat and Happy

Thin is definitely in, but what our modern flip chip devices really want is to be flat and happy! As flip chip die have become increasingly thinner in recent...

WEBCASTS

Surface Cleaning and Preparation

This introduction requires the development of new critical and selective cleans tackling galvanic corrosion, pattern collapse both in FEOL and BEOL...

450mm Status Report

Hear from the G450C General Manager, Paul Farrar Jr., on the current status of activities, key milestones and schedules, and imec’s senior business...

Join The ConFab discussion

Tue Feb 26 11:27:00 CST 2013

Questions and answers on FD-SOI

Fri Jan 04 14:56:00 CST 2013

Present your ideas at The ConFab in 2013

Mon Nov 26 09:04:00 CST 2012

The ConFab 2013 countdown begins

Thu Aug 09 16:18:00 CDT 2012

The ConFab: Big data is here

Sun Jun 03 19:19:00 CDT 2012

SUBSCRIBE

LATEST ISSUE

05/01/2013
Volume 56, Issue 3

Article Archive for Solid State Technology.

© 2013. PennWell Corporation. All Rights Reserved. PRIVACY POLICY | TERMS AND CONDITIONS