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Photovoltaics 2003 P

  • 09/05/2003 -- Silecs pursues a non-porous low-k solution
    Start-up Silecs has joined the ongoing industry battle between CVD and SOD processes used to make low-k dielectrics with its own organosiloxane-based low-k dielectric material that is effectively non-porous.
  • 09/02/2003 -- Chartered sees 90% yields for 0.13-micron
    September 2, 2003 - In an effort to keep pace with Taiwanese rivals, Singapore's Chartered Semiconductor says it has ramped up production for its 0.13-micron silicon manufacturing.
  • 09/02/2003 -- SMIC buying chip equipment
    September 2, 2003 - Calling all equipment makers -- Shanghai-based semiconductor firm SMIC wants to buy $1 billion in chipmaking equipment for its new plant in Beijing, according to local reports.
  • 09/02/2003 -- Intel ups investment in Elpida
    September 2, 2003 - Intel Corp., Santa Clara, CA, has pledged an additional $23 million to Elpida Memory Inc., Tokyo, Japan, a JV between Hitachi and NEC, to help Elpida boost production of its SDRAM chips.
  • 09/02/2003 -- Xignal launches front-end design IP
    September 2, 2003 - Xignal Technologies AG, Munich, Germany, an IP provider for the communications semiconductor industry, has released a new AFE design for mixed-signal ICs.
  • 09/02/2003 -- Sino-American Silicon gets order boost
    August 28, 2003 - Wafer manufacturer Sino-American Silicon says it has renewed a three-year, $8.8 million procurement deal with Danish firm Topsil.
  • 09/02/2003 -- CSMC, Chartered forge equipment pact
    August 28, 2003 - Chartered Semiconductor, Singapore, has signed an agreement to sell used equipment and technology to CSMC Technology Corp., a 150mm IC foundry in Hong Kong, in exchange for $33 million in cash and shares.
  • 09/02/2003 -- Toshiba leverages AMAT's low-k at 90nm
    August 27, 2003 - Toshiba Corp. is using Applied Material's CVD low-k dielectric films in its 90nm CMOS4 process technology, the companies said. The processes are being used in Toshiba's TC3000 ASICs, produced at its Oita, Japan facility.
  • 08/28/2003 -- Elpida to absorb NEC facility
    August 26, 2003 - Elpida Memory, Tokyo, Japan, a JV between NEC and Hitachi, plans to take over NEC's production facility in Hiroshima to bolster its position in the DRAM market.
  • 08/26/2003 -- CoorsTek opens Korean facility
    August 25, 2003 - Semiconductor equipment supplier CoorsTek, Golden, CO, has added an 8.900-square-foot facility to its Gumi City, Korea operations.

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