Altis selects AMATS' single-wafer nitride deposition technology

October 22, 2001 - Santa Clara, CA - Altis Semiconductor, the joint venture of IBM and Infineon located in Corbeil-Essonnes, France, has selected Applied Materials' single-wafer SiNgen LPCVD (low pressure chemical vapor deposition) system to deposit critical silicon nitride films in the transistor region of its most advanced logic chips.

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