Ibis licenses IBM's silicon-on-insulator technology

12/28/2000

Danvers, Massachusetts--Ibis Technology Corp. recently licensed from IBM the right to manufacture and sell separation by implantation of oxygen/silicon-on-insulator (SIMOX-SOI) wafers, using IBM's proprietary process, to IBM and all Ibis customers.

Under the terms of the royalty-bearing agreement, Ibis has the right to use IBM's process to produce SIMOX-SOI wafers, which Ibis will then market as Advantox-MLD to IC manufacturers seeking to accelerate their SOI adoption process. In turn, Ibis has granted IBM rights to its patents used in the modified low dose (MLD) process. Additionally, Ibis will grant IBM warrants to purchase its common stock.

"IBM has proven the viability of the SIMOX-SOI process, from materials manufacturing through the most complex, state-of-the-art microprocessor production," says Ibis President Martin Reid. "We believe that this licensed process will establish a new baseline for the production of ICs. We have further improvements planned to lower costs and improve the quality of SIMOX wafers in the future."

The Advantox product line introduced by Ibis was specifically designed to provide low-cost, high-quality, SIMOX-SOI wafers for use in the manufacturing of complementary metal oxide semiconductor (CMOS) applications.

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