February 14, 2006 - Image Technology, a supplier of 1X full-field photomasks, has acquired a Lasertec Large Area Mask (LAM) defect inspection tool, and now claims to be the only merchant photomask manufacturer to offer sub-micron detection on 9-in. photomasks.
The tool, which also be used to inspect advanced phase shift masks, is capable of detecting surface contamination as well as inspecting photomasks between 4-9 in. in size.
"The acquisition of this tool puts Image Technology at the forefront of LAM technology, ensuring a long-term reliable supply of 9-in. defect free photomasks for the backend and packaging industry," Fernando Mendez, the company's VP of sales and marketing. "This latest capability is especially important to those companies who are at the 65nm and 45nm technology nodes and are using 1X full-field exposure tools in their bump lines.
"This defect inspection tool coupled with our defect repair and metrology tools will ensure our customers the most advance and highest quality LAM photomasks in the industry for years to come," added Image Technology president Alex Naderi.
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