A leading industrial standards-writing organization since 1953, IEST has established seven tracks of Recommended Practices (RP) in the Standards and Practices (S&P) portion of the Contamination Control (CC) program, including the most recent program in Nanoscience and Nanotechnology.
In the semiconductor industry, ultrapure water is used for cleaning and etching of wafers. Wafer rinsing, in particular, is responsible for the largest consumption of ultrapure water in the wafer fab.
The CleanRooms Webcast, USP 797-Facts and Fallacies, which originally aired on October 18, 2006, focused on USP 797 and raised a number of questions-so many, in fact, that several went unanswered due to time constraints.
In its current space mission on board the international space station (ISS), NASA is using air-sampling equipment from the Goettingen-based technology group Sartorius.
W. L. Gore & Associates, Inc. (Newark, DE) recently donated a supply of cleanroom garments to be used in the semiconductor research space of the Birck Nanotechnology Center’s Scifres Nanofabrication Laboratory, an ISO Class 3 (Class 1) facility at Purdue University.
ISPE recently announced that it will collaborate with FDA to facilitate the implementation of the new quality guidelines (Q8 and Q9) developed by the International Conference on Harmonization (ICH).
Whether it’s a maker of tools, filters, spaces, air quality monitors, or manufacturer of the wafers themselves, each member of the industry has a role to play in keeping the production environment clean.
