Intel Corp.'s (www.intel.com) recent breakthrough achievement of fully functional 70-Mbit static random access memory (SRAM) chips on a 65-nanometer (nm) manufacturing process makes the contamination control playing surface smaller and more critical than ever.
Having previously served a broad base of the filtration and fluid-particle separation market, the American Filtration and Separations Society (AFS) has decided its focus should now be on specifiers, buyers and users of filters and filtration equipment.
A high-speed micro- processor-based controller developed by Laboratory Control Systems claims to provide a pressure and airflow control and response mechanism for contamination control in cleanrooms and other critical environments.
Duffield Hall, a new state-of-the-art nanotechnology research and teaching facility at Cornell University, has increased the university's nanofabrication space by 50 percent and is providing updated accommodations for the renowned Nanoscale Science and Technology Facility.
With a half-million-dollar National Science Foundation (NSF) grant in hand, nanotechnology developer Nanomix Inc. is moving its disposable capnography sensor for anesthesia monitoring into clinical testing.
Following through on a vow made this spring, the Semiconductor Industry Association (SIA) is seeking proposals from investigators for an independent epidemiological study of U.S. semiconductor fab workers.
It remains that people are the main source of cleanroom contamination. And cleanroom applications demand apparel with ever-increasing protection against dry particles, static electricity and hazardous materials. Advances in fabric design result in more flexible, comfortable and protective apparel. Here's a sampling of products that'll keep you covered.